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Patent us multilevel resist plated transfer layer process drawing. New approaches for chip to interconnects integrating porous process flow of device fabrication steps. Patent us fast image simulation for photolithography drawing. Laser interference lithography and shadow for schematic diagrams of a two beam holography with splitter. Patent us pellicles for use during euv drawing. Patent us photoresist lift off process for fabricating drawing. Patent us pellicles for use during euv drawing. Electric
Photolithography steps meddic process schematic illustration of master fabrication with standard stepper thumbnail. Molecular ruler lithography using sacrificial host structures steps involved in implementing the a nanolithography process b. Development of nanoimprint processes for photovoltaic applications a the process chain to integrate contact grid features into pre existing. Patent us chromeless phase shift lithography cpl masks drawing.